EVALUATION OF A DOUBLE IMPLANTED DIFFUSED MOSFET FOR LOW POWER ANALOG APPLICATIONS

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" EVALUATION OF A DOUBLE IMPLANTED DIFFUSED MOSFET FOR LOW POWER ANALOG APPLICATIONS "

Document Type	:	Latin Dissertation
Language of Document	:	English
Record Number	:	149571
Doc. No	:	ET21363
Main Entry	:	Eric J. Basham
Title Proper	:	EVALUATION OF A DOUBLE IMPLANTED DIFFUSED MOSFET FOR LOW POWER ANALOG APPLICATIONS
Note	:	This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract	:	The reduced manufacturing and assembly cost, power savings, and increase inreliability are motivation for the move towards integrating analog and digital systems. Asa rule, higher levels of integration require additional process complexity and cost. Inaddition, the bulk of these systems will remain digital and as transistors dimensions fall,device engineering for maximum digital performance compromises analog transistorperformance. Asymmetric metal oxide semiconductor (MOS) devices can be included instandard digital complementary metal oxide semiconductor (CMOS) processes with littleadditional process complexity and display superior analog performance. One class of.
Subject	:	Electericl tess
	:	برق
electronic file name	:	TL44520.pdf
Title and statement of responsibility and	:	EVALUATION OF A DOUBLE IMPLANTED DIFFUSED MOSFET FOR LOW POWER ANALOG APPLICATIONS [Thesis]