Analysis of Multidielectric Thin Film Based FPI for High reflectivity and Lower Phase Shift

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" Analysis of Multidielectric Thin Film Based FPI for High reflectivity and Lower Phase Shift "

Document Type	:	Latin Dissertation
Language of Document	:	English
Record Number	:	148696
Doc. No	:	ET20488
Main Entry	:	Bhanu P. Uppalapati
Title Proper	:	Analysis of Multidielectric Thin Film Based FPI for High reflectivity and Lower Phase Shift
Note	:	This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract	:	Thin film layers used in design of MEMS based Fabry-Perot Interferometer hasbeen thoroughly analyzed. Reflectivity and phase shift are two important properties thatinfluence the overall performance of the FPI. Effects of phase shift on the FPIperformance in the wavelength range 3pm - 5pm are discussed. While it is easy to obtaina layer combination to get high reflectivity, finding a layer combination that has highreflectivity and low phase shift is a challenging task. Thin film design equations are.
Subject	:	Electericl tess
	:	برق
electronic file name	:	TL43625.pdf
Title and statement of responsibility and	:	Analysis of Multidielectric Thin Film Based FPI for High reflectivity and Lower Phase Shift [Thesis]