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" PRECISION EXCIMER LASER LITHOGRAPHY FOR CYLINDRICAL SUBSTRATES WITH THICK PHOTORESISTS "


Document Type : Latin Dissertation
Language of Document : English
Record Number : 151950
Doc. No : ET23742
Main Entry : Robert L. Cole
Title Proper : PRECISION EXCIMER LASER LITHOGRAPHY FOR CYLINDRICAL SUBSTRATES WITH THICK PHOTORESISTS
Note : This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract : This work presents development and establishment of excimer laser ablationmicrolithography for processing difficult cylindrical substrates. Preliminary excimerlaser ablation microlithography work was performed on glass planar substrates with thickphotoresist over a thin metal layer. Laser system parameters were investigated andoptimized for patterning thick photoresist without damaging the underlying thin metallayer. Metallic microstructures were realized by electroplating through the laser ablationpatterned thick photoresist mold and onto the thin seed metal layer.Cylindrical substrate processing capability was accomplished by adding andoptimizing the following equipment: dip coating module, horizontal axis rotation unit forelectron-beam evaporation metallization, high precision lathe, and modified.............-....,....-...,..tested for theQ1 PC1 bus cardBoth these projects mere sofixare des elopment efforts tonards contributing to dlfferentaspects of Roboucs and lZ1echatronics projects m the Controls and Roboucs Group..
Subject : Electericl tess
: برق
electronic file name : TL46999.pdf
Title and statement of responsibility and : PRECISION EXCIMER LASER LITHOGRAPHY FOR CYLINDRICAL SUBSTRATES WITH THICK PHOTORESISTS [Thesis]
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TL46999.pdf
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