DEVELOPMENT OF MICROFABRICATED MICRO-WELL STRUCTURES USING SU-8 (50) NEGATIVE PHOTORESIST

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" DEVELOPMENT OF MICROFABRICATED MICRO-WELL STRUCTURES USING SU-8 (50) NEGATIVE PHOTORESIST "

Document Type	:	Latin Dissertation
Language of Document	:	English
Record Number	:	151776
Doc. No	:	ET23568
Main Entry	:	Harshavafifhan C. Shinde
Title Proper	:	DEVELOPMENT OF MICROFABRICATED MICRO-WELL STRUCTURES USING SU-8 (50) NEGATIVE PHOTORESIST
Note	:	This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract	:	The fabrication of Microwell structures has been developed to be used as a genosensorat the Oakridge National Laboratories to carry out pmceses such as DNAHybridization. The basic structure consists of four well sizes namely; S o p , 150p.111,350pm and 7 5 0 ~ with street-width and sidewall thicknesses being 5 0 p each. Thewells are developed on channel glass, which has through holes of 1 0 ~ diameter.These holes are the region where the general process of the hybridization will becarried out. The four well sizes give a very broad speftnrm to work with and offa easeof operation in each case. Multiple well structures have been fabrcated and in eachcase providing constant height to the walls and m d t h s . The design to developthese wells rqulfed only a single photomask.........-....,....-...,..tested for theQ1 PC1 bus cardBoth these projects mere sofixare des elopment efforts tonards contributing to dlfferentaspects of Roboucs and lZ1echatronics projects m the Controls and Roboucs Group..
Subject	:	Electericl tess
	:	برق
electronic file name	:	TL46810.pdf
Title and statement of responsibility and	:	DEVELOPMENT OF MICROFABRICATED MICRO-WELL STRUCTURES USING SU-8 (50) NEGATIVE PHOTORESIST [Thesis]