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Document Type : Latin Dissertation
Language of Document : English
Record Number : 151684
Doc. No : ET23476
Main Entry : Marwan H. Khater, B.S.,IM.S. Physics
Title Proper : CHARACTERIZATION OF TRANSMISSION LINE EFFECTS AND ION-ION PLASMA FORMATION IN AN INDUCTIVELY COUPLED PLASMA ETCH REACTOR
Note : This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract : The pIasma and processing uniformity are greatly affected by the gas flow distri-bution and the source geometry in inductively coupled plasma (ICP) etch reactors.However. a reasonably uniform source design, along with uniform gas distribution,does not always guarantee uniform plasma, because transmission line (i.e. standingwave) effects also impact its performance. In this work, we demonstrate that the gasflow distribution can have a major impact on both the pIasrna density profiles andetch rate uniformity a t low pressures where one might expect diffusion to make gasflow distribution less important.......-....,....-...,..tested for theQ1 PC1 bus cardBoth these projects mere sofixare des elopment efforts tonards contributing to dlfferentaspects of Roboucs and lZ1echatronics projects m the Controls and Roboucs Group..
Subject : Electericl tess
: برق
electronic file name : TL46717.pdf
Title and statement of responsibility and : CHARACTERIZATION OF TRANSMISSION LINE EFFECTS AND ION-ION PLASMA FORMATION IN AN INDUCTIVELY COUPLED PLASMA ETCH REACTOR [Thesis]
 
 
 
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