A Three-Dimensional Front Tracking Algorithm for Etching and Deposition Processes

منو

" A Three-Dimensional Front Tracking Algorithm for Etching and Deposition Processes "

Document Type	:	Latin Dissertation
Language of Document	:	English
Record Number	:	151485
Doc. No	:	ET23277
Main Entry	:	Glenn William VanDerWoude
Title Proper	:	A Three-Dimensional Front Tracking Algorithm for Etching and Deposition Processes
Note	:	This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract	:	A three-dimensional front tracking algorithm is presented for the study of etch-ing and deposition in the context of semiconductor rnanufBCturing. The evolutionof the material d a c e is described by a Hamilton-Jacobi equation. Nonlocal effectssuch as resputtering and visibility require that the model be extended to includethe dependency of the Hamiltonian on the global surface shape.The solution algorithm achieves sharp resolution in the evolution of surf'e*edges and corners. The method is applied to a variety of etching and depositionprocesses. Examples showing the effiects of resputtering and redeposition are also....-....,....-...,..tested for theQ1 PC1 bus cardBoth these projects mere sofixare des elopment efforts tonards contributing to dlfferentaspects of Roboucs and lZ1echatronics projects m the Controls and Roboucs Group..
Subject	:	Electericl tess
	:	برق
electronic file name	:	TL46514.pdf
Title and statement of responsibility and	:	A Three-Dimensional Front Tracking Algorithm for Etching and Deposition Processes [Thesis]