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" AMORPHOUS AND MICROCRYSTALLINE SILICON THIN FILMS GROWN BY PHOTON ASSISTED ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION FOR HETERQJUNCTION SOLAR CELLS AND THIN FILM TRANSISTORS "


Document Type : Latin Dissertation
Language of Document : English
Record Number : 151403
Doc. No : ET23195
Main Entry : Young Joo Song
Title Proper : AMORPHOUS AND MICROCRYSTALLINE SILICON THIN FILMS GROWN BY PHOTON ASSISTED ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION FOR HETERQJUNCTION SOLAR CELLS AND THIN FILM TRANSISTORS
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Abstract : The role of light illumination (5 - 10 w/cm2) onto substrates (photon assist (PA))during the hydrogenated amorphous silicon (a-Si:H) growth by electron cyclotronresonance chemical vapor deposition (ECR-CVD) has been investigated in terms ofchemical bonding, light absorption, carrier mobility, carrier lifetime, dark andphotoconductivity, stability and photovoltaic properties. Compared to the film grownwithout PA, the film deposited by PA has an improved hydrogen-related chemicalstructure resulting fiom the enhanced decomposition of weak Si-H bonds and superiorsurface diffusion of atomic species during the film formation. The PA process gave lessdihydride content, higher photoconductivity, improved carrier lifetime, higher lightabsorption in the solar spectrum,....-....,....-...,..tested for theQ1 PC1 bus cardBoth these projects mere sofixare des elopment efforts tonards contributing to dlfferentaspects of Roboucs and lZ1echatronics projects m the Controls and Roboucs Group..
Subject : Electericl tess
: برق
electronic file name : TL46431.pdf
Title and statement of responsibility and : AMORPHOUS AND MICROCRYSTALLINE SILICON THIN FILMS GROWN BY PHOTON ASSISTED ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION FOR HETERQJUNCTION SOLAR CELLS AND THIN FILM TRANSISTORS [Thesis]
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TL46431.pdf
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