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Document Type : Latin Dissertation
Language of Document : English
Record Number : 151269
Doc. No : ET23061
Main Entry : Paul Rummel
Title Proper : Improved Utility of Microwave Energy for Semiconductor Plasma Processing through RF System Stability Analysis and Enhancement
Note : This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract : The bulk of today' s semiconductor plasma processing equipment utilizes RFenergies at fiequencies fiom 50 KHz to 60 MHz for deposition, etching, cleaning andvarious other processes. One of the impediments to utilizing microwave energy for theseprocesses is the inherent instability often encountered with systems operating atfiequencies of .5 to 2.45 GHz. Systems with plasma loads excited by resonant antennas,impedance matched by resonant circuits or cavities, and powered by generators ofvarious source impedances are invariably unstable over some operating conditions. Formicro wave systems, this instability typically manifests itself as a propensity for theplasma to extinguish or rapidly change to a lower density as the impedance matchingdevice is adjusted to minimize reflected power to the microwave generator.This paper shows why this instability exists-....,....-...,..tested for theQ1 PC1 bus cardBoth these projects mere sofixare des elopment efforts tonards contributing to dlfferentaspects of Roboucs and lZ1echatronics projects m the Controls and Roboucs Group..
Subject : Electericl tess
: برق
electronic file name : TL46293.pdf
Title and statement of responsibility and : Improved Utility of Microwave Energy for Semiconductor Plasma Processing through RF System Stability Analysis and Enhancement [Thesis]
 
 
 
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