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" FABRICATION, CHARACTERIZATION AND HALL MOBILITY ANALYSIS OF MOS DEVICES WITH LOW K AND HIGH K DIELECTRIC MATERIALS "


Document Type : Latin Dissertation
Language of Document : English
Record Number : 148720
Doc. No : ET20512
Main Entry : RAKSHIT AGRAWAL
Title Proper : FABRICATION, CHARACTERIZATION AND HALL MOBILITY ANALYSIS OF MOS DEVICES WITH LOW K AND HIGH K DIELECTRIC MATERIALS
Note : This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract : I would like to thank Dr. Wiley P. Kirk for giving me a great opportunity towork on this project. His invaluable guidance and motivation has been primarilyinstrumental in my Masterبs research over the last one and a half years. He gave meample freedom to express my views and implement my ideas and encouraged methroughout, which gave me a good insight of some of the most difficult and interestingaspects of semiconductor processing and characterization..
Subject : Electericl tess
: برق
electronic file name : TL43649.pdf
Title and statement of responsibility and : FABRICATION, CHARACTERIZATION AND HALL MOBILITY ANALYSIS OF MOS DEVICES WITH LOW K AND HIGH K DIELECTRIC MATERIALS [Thesis]
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TL43649.pdf
TL43649.pdf
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