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Document Type : Latin Dissertation
Language of Document : English
Record Number : 148532
Doc. No : ET20324
Main Entry : Hua Sheng
Title Proper : INTERACTION OF INTENSE LASER PULSES WITH DROPLET AND CLUSTER SOURCES: APPLICATION TO EXTREME ULTRAVIOLETLITHOGRAPHY AND PLASMA WAVEGUIDE GENERATION
Note : This document is digital این مدرک بصورت الکترونیکی می باشد
Abstract : Several topics were studied in the interaction of intense laser pulses with dropletand cluster sources. Laser pulse-formatting that can enhance laser-to-EUV conversionefficiency in the 13.5nm band for next generation lithography was first explored,using droplet sources as the laser target. Xenon droplets size distribution wasmeasured, and the droplet plasma spectrum irradiated by various laser energies wasscanned. A 2-pulse heater setup and a 4-pulse stacker scheme were built and studied.Results suggest that, unlike droplets of argon (Ar) and krypton (Kr), the ionization-state distribution in xenon may be much more transient. The decay timescales for.
Subject : Electericl tess
: برق
electronic file name : TL43451.pdf
Title and statement of responsibility and : INTERACTION OF INTENSE LASER PULSES WITH DROPLET AND CLUSTER SOURCES: APPLICATION TO EXTREME ULTRAVIOLETLITHOGRAPHY AND PLASMA WAVEGUIDE GENERATION [Thesis]
 
 
 
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